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Ohara SK-1300/SK-1310/SK-1320
Ohara
CLASER-XS002
Characteristics：
• The VAD method developed for optical fiber has been further improved to manufacture fused silica.
• Ultra-high purity (total metallic impurities less than 0.5ppm)
• The OH content can be controlled to 1 ppm or less.
• High heat resistance is ensured.
• High transmission is achieved. (The SK-1310 has excellent
characteristics over the entire wavelength range of ultraviolet, visible, and infrared.)
• Contains no bubbles or striae.
• Excellent laser resistance properties
Application：
• Wafers for various types of devices such as TFT (poly-si thin-film transistor LCD), SOI (Silicon on Insulator) etc.
• Photomask substrates for ultra-LSI and LCD.
• Optical elements, lenses, mirrors and windows for ultraviolet and vacuum ultraviolet.
Standard Size：
•50~ 500mm round
•50~ 1000mm square
Characteristics：
• The VAD method developed for optical fiber has been further improved to manufacture fused silica.
• Ultra-high purity (total metallic impurities less than 0.5ppm)
• The OH content can be controlled to 1 ppm or less.
• High heat resistance is ensured.
• High transmission is achieved. (The SK-1310 has excellent
characteristics over the entire wavelength range of ultraviolet, visible, and infrared.)
• Contains no bubbles or striae.
• Excellent laser resistance properties
Application：
• Wafers for various types of devices such as TFT (poly-si thin-film transistor LCD), SOI (Silicon on Insulator) etc.
• Photomask substrates for ultra-LSI and LCD.
• Optical elements, lenses, mirrors and windows for ultraviolet and vacuum ultraviolet.
Standard Size：
•50~ 500mm round
•50~ 1000mm square
