Hellma CaF2
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Hellma CaF2

Hellma Materials CaF2 has been utilized as an optical key material in microlithography for semiconductor production for many years.
CaF2 is established as an industry standard material for excimer laser optics in projection and illumination optics.
The unique optical properties of CaF2 enable a variety of advanced applications.
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  • Hellma CaF2

  • Hellma

  • CLASER XS011#

General Introduction:

Hellma Materials CaF2 has been utilized as an optical key material in microlithography for semiconductor production for many years.

CaF2 is established as an industry standard material for excimer laser optics in projection and illumination optics.
The unique optical properties of CaF2 enable a variety of advanced applications.


Main Advantages:

1. It is widely used in 248nm and 193nm microscopic imaging technology, lighting and projection optics.

2. High purity calcium chloride single crystals allow fabrication of up to 440mm in diameter and over 100mm in thickness.

3. Its high laser durability makes it the material of choice for quasimolecular laser optics, beam transmission, and other excimer wavelengths for a wide range of applications.

4. Complete the application range of optical materials from vacuum UV to infrared, with excellent transmittance from 130nm to 9nm.


Applications:

Due to its superior optical quality and excellent transmittance in UV, VIS and IR spectral ranges, Hellma Materials CaF2 can be used in versatile applications:

1. IR optics

2. Optics for astronomical instrumentation

3. Space-based optics

4. Microscope optics

5. Spectroscopy optics

6. UV optics

7. Laser windows

8. Excimer laser optics

9. Microlithography optics

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